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About DNA PlasmaPurge

Plasma cleaning is a process that may be used to combat contaminants, contagions, and pathogens at the microscopic level. It is particularly effective on surfaces with organic or inorganic residues, such as oils, grease, dust, or remnants from previous processes. It has found significant value in industries like electronics manufacturing and medical equipment, where surface cleanliness is imperative.

Perhaps one of the most notable benefits of plasma cleaning is its ability to achieve cleanliness without chemical solvents, making it both an environmentally friendly and process-efficient choice capable of disinfecting surfaces and inactivating pathogens effectively.

The reactive species generated by plasma can kill bacteria, viruses, and DNA, making plasma sterilisation a reliable and rapid method.

Hospitals and healthcare facilities rely on plasma cleaning technology to maintain high levels of cleanliness and prevent the spread of infections, ultimately safeguarding the wellbeing of patients. Medical device manufacturers also utilise plasma treatment to ensure the sterility and safety of their products and components.

A Process You Can Trust

In forensic laboratories, it’s crucial to clean all integral surfaces of equipment to prevent DNA cross-contamination and transfer. This is an important consideration for end users.

Most Standard Operating Procedures (SOPs) in laboratories include protocols for eliminating DNA after each processing cycle, typically between caseloads. These procedures usually involve chemical cleaning with decontamination fluids or Shortwave UVC (254 nm) irradiation, each with its own advantages and limitations.

DNA PlasmaPurge offers the same benefits but without the drawbacks.

New VMDs are DNA PlasmaPurge ready.

Upgrade your existing VMD with DNA PlasmaPurge today!

Peer-Reviewed Journal Article

The use of non-thermal plasma for DNA decontamination in a forensic Vacuum Metal Deposition chamber: A proof of concept study

Phase I.

Authors: Katie Hussain, Dr. Roberto S.P. King, Raymond N. Allan, Dr. Kevin J. Farrugia, Urszula Krzeminska-Ahmadzai

Published on 25 March 2025 in Forensic Science International

Open access – Click here to read.

Abstract

Vacuum Metal Deposition (VMD) is routinely deployed for fingermark development on various types of evidence. In efforts to implement a sequential forensic workflow where fingerprints are processed before DNA collection to maximise evidential value, it is essential to prevent cross-contamination between analysed items. Non-thermal plasma (NTP) presents a potential advantage in DNA decontamination as it can reach areas that are inaccessible to conventional UV-C light and eliminates the need for solvents that might interfere with the vacuum-based systems.
In this study, different NTP conditions generated within a VMD chamber were tested on human cells with known DNA concentrations, and cell-free DNA. This included variations in power (maximum and medium), exposure times (0.5 h, 1 h, 2 h), and pressures (1.68, 2, 4.27 ×10-1 mbar). Overall, a reduction of approximately 100-fold in DNA concentration was observed after plasma treatment. Out of the tested conditions 1 h, 2 ×10-1 mbar and maximum power proved to be the most stable plasma for the DNA removal. While UV-C light was more efficient at degrading cell-free DNA in direct line of sight by reducing DNA levels below the limit of detection and showing significant degradation, NTP was more effective at eliminating DNA out of the line of sight. These findings suggest that NTP could be a promising tool for DNA decontamination of forensic instruments like VMD. Future research should focus on optimizing NTP settings, including power output and vacuum conditions, to ensure complete DNA removal.